Topical Symposium 2
Borides and boron-containing thin film materials are emerging as the next generation of hard, wear-, oxidation-, and corrosion-resistant coatings. Furthermore, various boron-based materials exhibit unique properties obtaining high potential for functional and architectural designs. The aim of this symposium is to provide a platform for first-principles design, synthesis, characterization of properties and defect structure as well as applications of different types of boron-containing protective and functional thin films. A strong intent is directed towards the initiation of an in-depth discussion covering a broad range of boron-containing materials and synthesis technologies including approaches such as PVD and CVD but also on modeling and advanced characterization techniques.
TS2. Invited Speakers:
- John R. Abelson, University of Illinois at Urbana-Champaign, USA, “Metal Diborides Everywhere: Conformal Coating, Infilling, and Alloying by Low Temperature CVD”
- Jens Birch, Linköping Univ., IFM, Thin Film Physics Div., Sweden, “Boron Carbide Thin Films for State-of-the-Art Neutron Detectors at the ESS”
- Jinn P. Chu, National Taiwan University of Science and Technology (NTUST), Taiwan, “Boron-containing Metallic Glass Thin Films”
- Christian Mitterer, Montanuniversität Leoben, Austria, “Boride-based Hard Coatings – Three Decades from the Early Beginnings to a Knowledge-based Materials Design”
- Christina Scheu, Max-Planck Institut für Eisenforschung, Germany, ” Insights in the Structure, Defects and Stability of Mo2BC Thin Films by Advanced Characterization Methods”